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Soothing Clay Mask

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Skin1004
Madagascar Centella Poremizing Quick Clay Stick Mask

Product category and function

Soothing Clay Mask

Madagascar Centella Poremizing Quick Clay Stick Mask

Wash-off Masks	Wash-off Masks
Masks that are applied and rinsed off after a set time.	Masks that are applied and rinsed off after a set time.
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Ingredient highlights

Soothing Clay Mask

Madagascar Centella Poremizing Quick Clay Stick Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free cruelty-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free vegan cruelty-free

Full ingredient list

Soothing Clay Mask

Madagascar Centella Poremizing Quick Clay Stick Mask

No. of common ingredients = 0
Aqua (water), glycerin, bentonite, kaolin, illite, glyceryl ricinoleate, alcohol denat., cetearyl olivate, leuconostoc/radish root ferment filtrate, caprylyl glycol, cetyl alcohol, cetearyl alcohol, stearyl alcohol, sorbitan olivate, polysorbate 60, sodium gluconate, charcoal powder, citric acid, o-cymen-5-ol, hamamelis virginiana (witch hazel) water, alcohol 7	Water, kaolin (8%), dipropylene glycol, glycerin, titanium dioxide/ci 77891, butylene glycol, sodium stearate, centella asiatica extract (4.9%), 1,2-hexanediol, phaseolus angularis seed powder, aloe barbadensis leaf extract, cetearyl olivate, propanediol, sorbitan olivate, dimethicone, iron oxides (ci 77491), ethylhexylglycerin, sodium phytate, bentonite, illite, mineral salts, montmorillonite, calamine

No. of common ingredients = 0

Total Number of ingredients = 21

Total Number of ingredients = 23

Aqua (water), glycerin, bentonite, kaolin, illite, glyceryl ricinoleate, alcohol denat., cetearyl olivate, leuconostoc/radish root ferment filtrate, caprylyl glycol, cetyl alcohol, cetearyl alcohol, stearyl alcohol, sorbitan olivate, polysorbate 60, sodium gluconate, charcoal powder, citric acid, o-cymen-5-ol, hamamelis virginiana (witch hazel) water, alcohol

Water, kaolin (8%), dipropylene glycol, glycerin, titanium dioxide/ci 77891, butylene glycol, sodium stearate, centella asiatica extract (4.9%), 1,2-hexanediol, phaseolus angularis seed powder, aloe barbadensis leaf extract, cetearyl olivate, propanediol, sorbitan olivate, dimethicone, iron oxides (ci 77491), ethylhexylglycerin, sodium phytate, bentonite, illite, mineral salts, montmorillonite, calamine

Notable ingredients

Soothing Clay Mask

Madagascar Centella Poremizing Quick Clay Stick Mask

Soothing: Hamamelis virginiana (witch hazel) water

Solvent: Aqua (water), Alcohol denat, Alcohol, Glycerin

Abrasive: Charcoal powder, Illite, Kaolin

Soothing: Centella asiatica extract (4.9%)

Antioxidant: Centella asiatica extract (4.9%)

Solvent: Water, 1,2-hexanediol, Butylene glycol, Dipropylene glycol, Glycerin, Propanediol

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Ingredients with their functions

Soothing Clay Mask

Madagascar Centella Poremizing Quick Clay Stick Mask

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Glycerin

Also-called: Glycerol | Function: Skin-identical ingredient, Viscosity controlling, Skin protecting, Skin conditioning, Humectant/Moisturizer, Solvent