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| Conditioners | Conditioners |
|---|---|
Moisturizing products to nourish and soften hair. |
Moisturizing products to nourish and soften hair. |
| ---- | ---- |
| Ingredient info | Ingredient info |
|---|---|
|
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free |
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free |
| No. of common ingredients = 0 | |
|---|---|
| Total Number of ingredients = 23 | Total Number of ingredients = 28 |
|
Aqua/water/eau,
Skin conditioning,
Solvent
cetearyl alcohol,
Emollient/Moisturizer,
Viscosity controlling,
Surfactant/Cleansing,
Skin conditioning,
Emulsion stabilizing
cetrimonium chloride,
Surfactant/Cleansing,
Preservative,
Anti-microbial
keratin amino acids,
Skin conditioning
simmondsia chinensis (jojoba) seed oil,
Emollient/Moisturizer,
Skin conditioning
hydroxypropyltrimonium hydrolyzed rice protein/siloxysilicate,
oryza sativa (rice) extract,
Skin conditioning,
Abrasive,
Absorbent
leuconostoc/radish root ferment filtrate,
Anti-microbial
populus tremuloides bark extract,
Skin conditioning
panthenol,
Soothing,
Skin conditioning,
Humectant/Moisturizer
sodium pca,
Skin conditioning,
Humectant/Moisturizer
glycerin,
Skin-identical ingredient,
Viscosity controlling,
Skin protecting,
Skin conditioning,
Humectant/Moisturizer,
Solvent
isopropyl palmitate,
Emollient/Moisturizer,
Skin conditioning
tocopherol,
Occlusive/Moisturizer,
Skin conditioning,
Antioxidant
caprylyl glycol,
Emollient/Moisturizer,
Skin conditioning,
Deodorant
tetrasodium glutamate diacetate,
Chelating
ethylhexylglycerin,
Skin conditioning,
Preservative,
Deodorant
distearyldimonium chloride,
chlorphenesin,
Preservative,
Anti-microbial
potassium hydroxide,
Buffering
citric acid,
Chelating,
Buffering
parfum/fragrance,
Perfuming,
Masking
hexyl cinnamal
Perfuming
|
Aqua/water/eau,
Skin conditioning,
Solvent
cetearyl alcohol,
Emollient/Moisturizer,
Viscosity controlling,
Surfactant/Cleansing,
Skin conditioning,
Emulsion stabilizing
amodimethicone,
Emollient/Moisturizer
behentrimonium methosulfate,
Surfactant/Cleansing
behentrimonium chloride,
Preservative
camellia oleifera seed oil,
Emollient/Moisturizer,
Skin conditioning
argania spinosa kernel oil,
Emollient/Moisturizer,
Skin conditioning
potassium hydroxide,
Buffering
glycerin,
Skin-identical ingredient,
Viscosity controlling,
Skin protecting,
Skin conditioning,
Humectant/Moisturizer,
Solvent
trideceth-6,
Surfactant/Cleansing
aloe barbadensis leaf juice,
Skin conditioning
hydroxypropyl guar,
Film forming,
Viscosity controlling,
Surfactant/Cleansing,
Emulsion stabilizing
dipropylene glycol,
Viscosity controlling,
Solvent
citric acid,
Chelating,
Buffering
tocopherol,
Occlusive/Moisturizer,
Skin conditioning,
Antioxidant
phenoxyethanol,
Preservative,
Anti-microbial
cetrimonium chloride,
Surfactant/Cleansing,
Preservative,
Anti-microbial
benzoic acid,
pH adjusters,
Preservative
ci 14700/red 4,
ci 19140/yellow 5,
parfum/fragrance,
Perfuming,
Masking
linalool,
Perfuming,
Deodorant
limonene,
Perfuming,
Deodorant,
Solvent
hydroxycitronellal,
Perfuming
citronellol,
Perfuming
hexyl cinnamal,
Perfuming
benzyl alcohol,
Viscosity controlling,
Preservative,
Solvent
benzyl salicylate
Perfuming
|
1
Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent
2
Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing
We don’t have a detailed description of this ingredient yet.
3
Function: Surfactant/Cleansing, Preservative, Anti-microbial
We don’t have a detailed description of this ingredient yet.
1
Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent
2
Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing
We don’t have a detailed description of this ingredient yet.
3
Function: Emollient/Moisturizer
We don’t have a detailed description of this ingredient yet.
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