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Kerastase
Discipline Masque Oléo Relax Hair Mask

Versus

Keune
So Pure Polish Mask

Product category and function

Discipline Masque Oléo Relax Hair Mask

So Pure Polish Mask

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

Discipline Masque Oléo Relax Hair Mask

So Pure Polish Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free

Full ingredient list

Discipline Masque Oléo Relax Hair Mask

So Pure Polish Mask

No. of common ingredients = 0
Aqua/water, stearyl alcohol, dimethicone, behentrimonium chloride, glycerin, amodimethicone, cetyl esters, isopropyl alcohol, paraffinum liquidum/mineral oil, cetrimonium chloride, caprylyl glycol, trideceth-15, trideceth-3, benzyl salicylate, chlorhexidine digluconate, benzyl alcohol, citronellol, linalool, phenoxyethanol, geraniol, citric acid, acetic acid, cocos nucifera oil (coconut oil), plukenetia volubilis seed oil, caprylic/capric glycerides, rosa canina flower extract, tocopherol, parfum/fragrance 10	Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

No. of common ingredients = 0

Total Number of ingredients = 28

Total Number of ingredients = 22

Aqua/water, stearyl alcohol, dimethicone, behentrimonium chloride, glycerin, amodimethicone, cetyl esters, isopropyl alcohol, paraffinum liquidum/mineral oil, cetrimonium chloride, caprylyl glycol, trideceth-15, trideceth-3, benzyl salicylate, chlorhexidine digluconate, benzyl alcohol, citronellol, linalool, phenoxyethanol, geraniol, citric acid, acetic acid, cocos nucifera oil (coconut oil), plukenetia volubilis seed oil, caprylic/capric glycerides, rosa canina flower extract, tocopherol, parfum/fragrance

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Notable ingredients

Discipline Masque Oléo Relax Hair Mask

So Pure Polish Mask

Antioxidant: Tocopherol

Solvent: Aqua/water, Benzyl alcohol, Glycerin, Paraffinum liquidum/mineral oil, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Chlorhexidine digluconate, Phenoxyethanol

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

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Ingredients with their functions

Discipline Masque Oléo Relax Hair Mask

So Pure Polish Mask

Aqua/water

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Stearyl alcohol

Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing