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Keune
So Pure Polish Mask

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Aveda
Nutriplenish Treatment Masque Light Moisture

Product category and function

So Pure Polish Mask

Nutriplenish Treatment Masque Light Moisture

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

So Pure Polish Mask

Nutriplenish Treatment Masque Light Moisture

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free vegan cruelty-free

Full ingredient list

So Pure Polish Mask

Nutriplenish Treatment Masque Light Moisture

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 10	Water/aqua/eau, cetearyl alcohol, cocos nucifera (coconut) oil, stearamidopropyl dimethylamine, behenyl alcohol, behentrimonium chloride, glycerin, distearyldimonium chloride, mangifera indica (mango) seed butter, punica granatum (pomegranate) seed oil, helianthus annuus (sunflower) seed oil, limnanthes alba (meadowfoam) seed oil, coco-caprylate/caprate, heptyl undecylenate, squalane, lactic acid, euphorbia cerifera (candelilla) wax (candelilla cera)cire de candelilla, sodium gluconate, hydroxyethylcellulose, octyldodecyl citrate crosspolymer, tocopherol, fragrance (parfum), linalool, limonene, geraniol, hydroxycitronellal, citral, citronellol, potassium sorbate, phenoxyethanol.

No. of common ingredients = 0

Total Number of ingredients = 22

Total Number of ingredients = 30

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Water/aqua/eau, cetearyl alcohol, cocos nucifera (coconut) oil, stearamidopropyl dimethylamine, behenyl alcohol, behentrimonium chloride, glycerin, distearyldimonium chloride, mangifera indica (mango) seed butter, punica granatum (pomegranate) seed oil, helianthus annuus (sunflower) seed oil, limnanthes alba (meadowfoam) seed oil, coco-caprylate/caprate, heptyl undecylenate, squalane, lactic acid, euphorbia cerifera (candelilla) wax (candelilla cera)cire de candelilla, sodium gluconate, hydroxyethylcellulose, octyldodecyl citrate crosspolymer, tocopherol, fragrance (parfum), linalool, limonene, geraniol, hydroxycitronellal, citral, citronellol, potassium sorbate, phenoxyethanol.

Notable ingredients

So Pure Polish Mask

Nutriplenish Treatment Masque Light Moisture

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

Antioxidant: Punica granatum (pomegranate) seed oil, Tocopherol

Exfoliant: Lactic acid

Solvent: Water/aqua/eau, Glycerin, Helianthus annuus (sunflower) seed oil, Limonene

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Ingredients with their functions

So Pure Polish Mask

Nutriplenish Treatment Masque Light Moisture

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing