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Keune
So Pure Polish Mask

Versus

Pattern Beauty
Treatment Mask

Product category and function

So Pure Polish Mask

Treatment Mask

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

So Pure Polish Mask

Treatment Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free vegan cruelty-free

Full ingredient list

So Pure Polish Mask

Treatment Mask

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 10	Water/aqua/eau, polyquaternium-37, saccharomyces/rice ferment filtrate, hydrolyzed rice protein, butylene glycol, hibiscus esculentus seed extract, caesalpinia spinosa fruit pod extract, moringa oleifera seed extract, helianthus annuus (sunflower) sprout extract, sodium benzoate, disodium phosphate, citric acid, glycerin, behentrimonium chloride, cetrimonium chloride, hydrogenated castor oil/sebacic acid copolymer, panthenol, dicaprylyl carbonate, quaternium-87, isopropyl alcohol, propylene glycol, chlorphenesin, lauryl glucoside, aminomethyl propanol, ethylhexylglycerin, potassium sorbate, fragrance/parfum, limonene, geraniol, citronellol, linalool, phenoxyethanol

No. of common ingredients = 0

Total Number of ingredients = 22

Total Number of ingredients = 32

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Water/aqua/eau, polyquaternium-37, saccharomyces/rice ferment filtrate, hydrolyzed rice protein, butylene glycol, hibiscus esculentus seed extract, caesalpinia spinosa fruit pod extract, moringa oleifera seed extract, helianthus annuus (sunflower) sprout extract, sodium benzoate, disodium phosphate, citric acid, glycerin, behentrimonium chloride, cetrimonium chloride, hydrogenated castor oil/sebacic acid copolymer, panthenol, dicaprylyl carbonate, quaternium-87, isopropyl alcohol, propylene glycol, chlorphenesin, lauryl glucoside, aminomethyl propanol, ethylhexylglycerin, potassium sorbate, fragrance/parfum, limonene, geraniol, citronellol, linalool, phenoxyethanol

Notable ingredients

So Pure Polish Mask

Treatment Mask

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

Soothing: Panthenol

Solvent: Water/aqua/eau, Butylene glycol, Glycerin, Limonene, Propylene glycol, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Chlorphenesin, Phenoxyethanol

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Ingredients with their functions

So Pure Polish Mask

Treatment Mask

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing