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So Pure Polish Mask

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Pureology
Hydrate Soft Softening Treatment

Product category and function

So Pure Polish Mask

Hydrate Soft Softening Treatment

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

So Pure Polish Mask

Hydrate Soft Softening Treatment

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free

Full ingredient list

So Pure Polish Mask

Hydrate Soft Softening Treatment

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 11	Aqua/water/eau, cetearyl alcohol, dimethicone, glycerin, behentrimonium chloride, parfum/fragrance, amodimethicone, cetrimonium chloride, phenoxyethanol, isopropyl alcohol, prunus amygdalus dulcis oil/sweet almond oil, tocopheryl acetate, butyrospermum parkii butter/shea butter, lactic acid, butylene glycol, dilauryl thiodipropionate, linalool, caramel, helianthus annuus seed extract/sunflower seed extract, limonene, alpha-isomethyl ionone, citronellol, geraniol, benzophenone-4, ci 17200/red 33, citric acid

No. of common ingredients = 0

Total Number of ingredients = 22

Total Number of ingredients = 26

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Aqua/water/eau, cetearyl alcohol, dimethicone, glycerin, behentrimonium chloride, parfum/fragrance, amodimethicone, cetrimonium chloride, phenoxyethanol, isopropyl alcohol, prunus amygdalus dulcis oil/sweet almond oil, tocopheryl acetate, butyrospermum parkii butter/shea butter, lactic acid, butylene glycol, dilauryl thiodipropionate, linalool, caramel, helianthus annuus seed extract/sunflower seed extract, limonene, alpha-isomethyl ionone, citronellol, geraniol, benzophenone-4, ci 17200/red 33, citric acid

Notable ingredients

So Pure Polish Mask

Hydrate Soft Softening Treatment

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

Sunscreen/UV filter: Benzophenone-4

Antioxidant: Dilauryl thiodipropionate, Tocopheryl acetate

Exfoliant: Lactic acid

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Ingredients with their functions

So Pure Polish Mask

Hydrate Soft Softening Treatment

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing