Disclosure: This page may contain affiliate links. Read our full disclosure policy.

Keune
So Pure Polish Mask

Versus

Redken
Acidic Bonding Concentrate 5 Min Liquid Mask

Product category and function

So Pure Polish Mask

Acidic Bonding Concentrate 5 Min Liquid Mask

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
----	----

Ingredient highlights

So Pure Polish Mask

Acidic Bonding Concentrate 5 Min Liquid Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free

Full ingredient list

So Pure Polish Mask

Acidic Bonding Concentrate 5 Min Liquid Mask

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 10	Aqua/water/eau, cetearyl alcohol, behentrimonium chloride, dimethicone, amodimethicone, isopropyl alcohol, sodium citrate, glycerin, citric acid, c15-19 alkane, dicetyldimonium chloride, parfum/fragrance, phenoxyethanol, cetyl esters, hydroxypropyl guar, limonene, trideceth-6, dilauryl thiodipropionate, cetrimonium chloride, linalool, citronellol, trisodium hedta

No. of common ingredients = 0

Total Number of ingredients = 22

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Aqua/water/eau, cetearyl alcohol, behentrimonium chloride, dimethicone, amodimethicone, isopropyl alcohol, sodium citrate, glycerin, citric acid, c15-19 alkane, dicetyldimonium chloride, parfum/fragrance, phenoxyethanol, cetyl esters, hydroxypropyl guar, limonene, trideceth-6, dilauryl thiodipropionate, cetrimonium chloride, linalool, citronellol, trisodium hedta

Notable ingredients

So Pure Polish Mask

Acidic Bonding Concentrate 5 Min Liquid Mask

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

Antioxidant: Dilauryl thiodipropionate

Solvent: Aqua/water/eau, C15-19 alkane, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Phenoxyethanol

Load all

Ingredients with their functions

So Pure Polish Mask

Acidic Bonding Concentrate 5 Min Liquid Mask

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing