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Keune
So Pure Polish Mask

Versus

Verb
Ghost™ Mask

Product category and function

So Pure Polish Mask

Ghost™ Mask

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

So Pure Polish Mask

Ghost™ Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free

Full ingredient list

So Pure Polish Mask

Ghost™ Mask

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 12	Aqua/water/eau, dimethicone, stearyl alcohol, cetyl alcohol, glycerin, cetyl esters, behentrimonium chloride, quaternium-80, peg-12 dimethicone, stearamidopropyl dimethylamine, amodimethicone, isopropyl myristate, moringa oleifera seed oil, pelvetia canaliculata extract, ethylhexylglycerin, cetrimonium chloride, trideceth-12, citric acid, isopropyl alcohol, peg-12 allyl ether, parfum/fragrance, xylitylglucoside, anhydroxylitol, polyquaternium-10, polyquaternium-67, maltitol, caprylyl glycol, propylene glycol, xylitol, myristyl alcohol, sodium acetate, sodium benzoate, chlorphenesin, phenoxyethanol, hydroxycitronellal, butylphenyl methylpropional, limonene, linalool

No. of common ingredients = 0

Total Number of ingredients = 22

Total Number of ingredients = 38

Aqua (water), cetearyl alcohol, behentrimonium chloride, glycerin, cetrimonium chloride, parfum (fragrance), isopropyl alcohol, isopropyl myristate, betaine, sodium benzoate, lactic acid, butyrospermum parkii (shea) butter, linum usitatissimum (linseed) seed extract, salvia hispanica seed extract, benzyl alcohol, caprylic acid, xylitol, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Aqua/water/eau, dimethicone, stearyl alcohol, cetyl alcohol, glycerin, cetyl esters, behentrimonium chloride, quaternium-80, peg-12 dimethicone, stearamidopropyl dimethylamine, amodimethicone, isopropyl myristate, moringa oleifera seed oil, pelvetia canaliculata extract, ethylhexylglycerin, cetrimonium chloride, trideceth-12, citric acid, isopropyl alcohol, peg-12 allyl ether, parfum/fragrance, xylitylglucoside, anhydroxylitol, polyquaternium-10, polyquaternium-67, maltitol, caprylyl glycol, propylene glycol, xylitol, myristyl alcohol, sodium acetate, sodium benzoate, chlorphenesin, phenoxyethanol, hydroxycitronellal, butylphenyl methylpropional, limonene, linalool

Notable ingredients

So Pure Polish Mask

Ghost™ Mask

Exfoliant: Lactic acid

Solvent: Aqua (water), Benzyl alcohol, Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride

Solvent: Aqua/water/eau, Glycerin, Limonene, Propylene glycol, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Chlorphenesin, Phenoxyethanol

Buffering: Citric acid, Sodium acetate

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Ingredients with their functions

So Pure Polish Mask

Ghost™ Mask

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing