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Keune
So Pure Restore Mask

Versus

Verb
Ghost™ Mask

Product category and function

So Pure Restore Mask

Ghost™ Mask

Hair Masks	Hair Masks
Deep-conditioning treatments for intense hydration and repair.	Deep-conditioning treatments for intense hydration and repair.
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Ingredient highlights

So Pure Restore Mask

Ghost™ Mask

Ingredient info	Ingredient info
Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free	Alcohol-free Paraben-free SLS-free Mica-free Fragrance-free

Full ingredient list

So Pure Restore Mask

Ghost™ Mask

No. of common ingredients = 0
Aqua (water), cetearyl alcohol, glycerin, cetyl esters, ceteareth-20, behentrimonium chloride, stearamidopropyl dimethylamine, parfum (fragrance), citric acid, isopropyl myristate, betaine, butyrospermum parkii (shea) butter, cetrimonium chloride, phenoxyethanol, isopropyl alcohol, sodium benzoate, guar hydroxypropyltrimonium chloride, opuntia ficus-indica stem extract, disodium phosphate, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool 15	Aqua/water/eau, dimethicone, stearyl alcohol, cetyl alcohol, glycerin, cetyl esters, behentrimonium chloride, quaternium-80, peg-12 dimethicone, stearamidopropyl dimethylamine, amodimethicone, isopropyl myristate, moringa oleifera seed oil, pelvetia canaliculata extract, ethylhexylglycerin, cetrimonium chloride, trideceth-12, citric acid, isopropyl alcohol, peg-12 allyl ether, parfum/fragrance, xylitylglucoside, anhydroxylitol, polyquaternium-10, polyquaternium-67, maltitol, caprylyl glycol, propylene glycol, xylitol, myristyl alcohol, sodium acetate, sodium benzoate, chlorphenesin, phenoxyethanol, hydroxycitronellal, butylphenyl methylpropional, limonene, linalool

No. of common ingredients = 0

Total Number of ingredients = 24

Total Number of ingredients = 38

Aqua (water), cetearyl alcohol, glycerin, cetyl esters, ceteareth-20, behentrimonium chloride, stearamidopropyl dimethylamine, parfum (fragrance), citric acid, isopropyl myristate, betaine, butyrospermum parkii (shea) butter, cetrimonium chloride, phenoxyethanol, isopropyl alcohol, sodium benzoate, guar hydroxypropyltrimonium chloride, opuntia ficus-indica stem extract, disodium phosphate, benzyl salicylate, citronellol, hydroxycitronellal, limonene, linalool

Aqua/water/eau, dimethicone, stearyl alcohol, cetyl alcohol, glycerin, cetyl esters, behentrimonium chloride, quaternium-80, peg-12 dimethicone, stearamidopropyl dimethylamine, amodimethicone, isopropyl myristate, moringa oleifera seed oil, pelvetia canaliculata extract, ethylhexylglycerin, cetrimonium chloride, trideceth-12, citric acid, isopropyl alcohol, peg-12 allyl ether, parfum/fragrance, xylitylglucoside, anhydroxylitol, polyquaternium-10, polyquaternium-67, maltitol, caprylyl glycol, propylene glycol, xylitol, myristyl alcohol, sodium acetate, sodium benzoate, chlorphenesin, phenoxyethanol, hydroxycitronellal, butylphenyl methylpropional, limonene, linalool

Notable ingredients

So Pure Restore Mask

Ghost™ Mask

Solvent: Aqua (water), Glycerin, Limonene, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Phenoxyethanol

Buffering: Citric acid, Disodium phosphate

Solvent: Aqua/water/eau, Glycerin, Limonene, Propylene glycol, Isopropyl alcohol

Anti-microbial: Cetrimonium chloride, Chlorphenesin, Phenoxyethanol

Buffering: Citric acid, Sodium acetate

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Ingredients with their functions

So Pure Restore Mask

Ghost™ Mask

Aqua (water)

Also-called: Aqua, Aqua/Water, Water/Aqua/Eau, Aqua/Water/Eau | Function: Skin conditioning, Solvent

Water serves as a fundamental component in skincare products, often listed as the first ingredient, which means it's the most abundant. It acts as a solvent, helping to dissolve other ingredients and facilitate the application and absorption of products.

Cetearyl alcohol

Also-called: Cetostearyl alcohol, cetylstearyl alcohol | Function: Emollient/Moisturizer, Viscosity controlling, Surfactant/Cleansing, Skin conditioning, Emulsion stabilizing